Determination of the laterally homogeneous barrier height of thermally annealed and unannealed Au/p-InP/Zn-Au Schottky barrier diodes

Asubay S., Güllü Ö., TÜRÜT A.

APPLIED SURFACE SCIENCE, cilt.254, ss.3558-3561, 2008 (SCI İndekslerine Giren Dergi) identifier

  • Cilt numarası: 254 Konu: 11
  • Basım Tarihi: 2008
  • Doi Numarası: 10.1016/j.apsusc.2007.11.050
  • Sayfa Sayıları: ss.3558-3561


We have identically prepared Au/p-InP Schottky barrier diodes (SBDs). The diodes were annealed up to 400 degrees C thermally. The barrier height (BH) for the as-deposited Au/p-InP/Zn-Au SBDs from the current-voltage characteristics have varied from 0.58 to 0.72 eV, and ideality factor n from 1.14 to 1.47. The BH for the annealed SBDs from the current-voltage characteristics have varied from 0.76 to 0.82 eV, and ideality factor n from 1.17 to 1.39. As a result of the thermal annealing, it has been seen that the BH values of the annealed SBDs are larger than those of the as-deposited SBDs. We have determined a lateral homogeneous BH value of 0.72 eV for the as-deposited Au/p-InP SBD from the experimental linear relationship between barrier heights and ideality factors, and a value of 0.85 eV for the annealed Au/p-InP SBD. The increase of 0.13 eV in the BH value by means of 400 degrees C annealing has been ascribed to the formation of the excess charges that electrically actives on the semiconductor surface. (C) 2007 Elsevier B.V. All rights reserved.