Electronic parameters of MIS Schottky diodes with DNA biopolymer interlayer


GÜLLÜ Ö., TÜRÜT A.

MATERIALS SCIENCE-POLAND, cilt.33, ss.593-600, 2015 (SCI İndekslerine Giren Dergi)

  • Cilt numarası: 33 Konu: 3
  • Basım Tarihi: 2015
  • Doi Numarası: 10.1515/msp-2015-0089
  • Dergi Adı: MATERIALS SCIENCE-POLAND
  • Sayfa Sayısı: ss.593-600

Özet

In this work, we prepared an ideal Cu/DNA/n-InP biopolymer-inorganic Schottky sandwich device formed by coating a nInP semiconductor wafer with a biopolymer DNA. The Cu/DNA/n-InP contact showed a good rectifying behavior. The ideality factor value of 1.08 and the barrier height (Phi(b)) value of 0.70 eV for the Cu/DNA/n-InP device were determined from the forward bias I-V characteristics. It was seen that the Phi(b) value of 0.70 eV obtained for the Cu/DNA/n-InP contact was significantly larger than the value of 0.48 eV of conventional Cu/n-InP Schottky diodes. Modification of the interfacial potential barrier of Cu/n-InP diode was achieved using a thin interlayer of DNA biopolymer. This was attributed to the fact that DNA biopolymer interlayer increased the effective barrier height by influencing the space charge region of InP.