Determination of contact parameters of Ni/n-GaP Schottky contacts

Duman S., Ejderha K., Yigit O., TÜRÜT A.

MICROELECTRONICS RELIABILITY, vol.52, no.6, pp.1005-1011, 2012 (Journal Indexed in SCI) identifier identifier

  • Publication Type: Article / Article
  • Volume: 52 Issue: 6
  • Publication Date: 2012
  • Doi Number: 10.1016/j.microrel.2011.12.018
  • Page Numbers: pp.1005-1011


The electrical analysis of Ni/n-Gap structure has been investigated by means of current-voltage (I-V), capacitance-voltage (C-V) and capacitance-frequency (C-f) measurements in the temperature range of 120-320 K in dark conditions. The forward bias I-V characteristics have been analyzed on the basis of standard thermionic emission (TE) theory and the characteristic parameters of the Schottky contacts (SCs) such as Schottky barrier height (SBH), ideality factor (n) and series resistance (R-s) have been determined from the I-V measurements. The experimental values of SBH and n for the device ranged from 1.01 eV and 1.27 (at 320 K) to 0.38 eV and 5.93 (at 120 K) for Ni/n-Gap diode, respectively. The interface states in the semiconductor bandgap and their relaxation time have been determined from the C-f characteristics. The interface state density N-ss has ranged from 2.08 x 10(15) (eV(-1) m(-2)) at 120 K to 2.7 x 10(15) (eV(-1) m(-2)) at 320 K. C-ss has increased with increasing temperature. The relaxation time has ranged from 4.7 x 10(-7) s at 120 K to 5.15 x 10(-7) Sat 320 K. (C) 2011 Elsevier Ltd. All rights reserved.