On the electrical characteristics of the Al/rhodamine-101/p-Si MS structure at low temperatures

Karatas S., Cakar M., TÜRÜT A.

MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, vol.28, pp.135-143, 2014 (Journal Indexed in SCI) identifier identifier

  • Publication Type: Article / Article
  • Volume: 28
  • Publication Date: 2014
  • Doi Number: 10.1016/j.mssp.2014.08.013
  • Page Numbers: pp.135-143


In this paper, the current-voltage (I-V) characteristics of Al/Rhodamine-101/p-Si/Al metal semiconductor (MS) structures have been measured at temperatures ranging from 80 to 325 K. The nonpolymeric organic compound rhodamine-101 (Rh101) film on a p-type Si substrate has been formed by means of the evaporation process and the Sn/rhodamine-101/Si contacts have been fabricated. The current voltage characteristics of the diode show rectifying behaviour consistent with a potential barrier formed at the interface. The obtained I-V barrier heights (Phi(b)) were in the range of 0.287-0.820 eV with ideality factors (n) of 6.31-2.68. The high values of ideality factor (n) may be ascribed to decrease of the exponentially increase rate in current due to space charge injection into Rh101 thin film at higher voltage. The temperature-dependent I-V characteristics of the Al/Rhodamine-101/p-Si/Al structure have shown a Gaussian distribution giving mean barrier height of 0.918 eV and standard deviation of 0.104 V. The mean barrier height ((Phi) over bar (bo)) and the Richardson constant (A*) values were obtained as 1.046 eV and 31.87 A K-2 CM-2, respectively, by means of the modified Richardson plot, In [(I-0/T-2)-(q(2)sigma(2)(0)/2K(2)T(2))] plot 1/kT. The value of Richardson constant A* obtained from this plot is approximately the same with theoretical value of 32 A cm(-2) K-2 for p-Si. As a result, it can be concluded that the temperature dependent characteristic parameters for Al/Rhodamine-101/p-Si structure can be successfully explained on the basis of TE mechanism with Gaussian distribution of the barrier height (C) 2014 The Authors. Published by Elsevier Ltd.